COMPOSITE POLISHING PAD INCLUDING HIGHLY ABRASION-RESISTANT THIN FILM COATING BOUND WITH CARBON NANOTUBES, AND METHOD FOR PRODUCING SAME

The present invention provides a composite polishing pad for CMP, and a method for producing same. The composite polishing pad for CMP comprises: a soft polymer substrate layer including a plurality of protrusions formed on the upper surface thereof; a carbon nanotube layer including carbon nanotube...

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Bibliographische Detailangaben
Hauptverfasser:	HONG, Seok Ji, CHOI, Jung Hee, RYU, Hyun Jun, KANG, Suk Kyung, KIM, Seong Jae, MIN, Byung Ju, KANG, Min Woo, OH, Nam Gue, KIM, Seung Geun, JEONG, Ji Hun, KIM, San Ha
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL PROCESSES OF COMPOUNDING GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS POLISHING THEIR PREPARATION OR CHEMICAL WORKING-UP TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention provides a composite polishing pad for CMP, and a method for producing same. The composite polishing pad for CMP comprises: a soft polymer substrate layer including a plurality of protrusions formed on the upper surface thereof; a carbon nanotube layer including carbon nanotubes embedded in and bound to the upper portion of the substrate layer; and a hard polymer coating layer in which carbon nanotubes protruding outwardly are embedded in and bound to the upper portion of the carbon nanotube layer. La présente invention concerne un tampon de polissage composite pour CMP, et son procédé de production. Le tampon de polissage composite pour CMP comprend : une couche de substrat polymère souple comprenant une pluralité de saillies formées sur sa surface supérieure ; une couche de nanotubes de carbone comprenant des nanotubes de carbone incorporés dans et liés à la partie supérieure de la couche de substrat ; et une couche de revêtement polymère dur dans laquelle sont incorporés des nanotubes de carbone faisant saillie vers l'extérieur et liée à la partie supérieure de la couche de nanotubes de carbone. 본 발명은 상부면에 성형된 다수개의 돌기를 포함하는 연질 폴리머 기재층; 상기 기재층 상부에 함입되어 결착된 탄소나노튜브들을 포함하는 탄소나노튜브층; 및 상기 탄소나노튜브층 상부에 외부로 돌출된 탄소나노튜브들을 함입하여 결착시킨 경질 폴리머 코팅층;을 포함하는 CMP용 복합 연마패드 및 이의 제조방법을 제공한다.