WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM

An improved method of wafer inspection is disclosed. The improved method includes a non- transitory computer-readable medium storing a set of instructions that are executable by at least one processor of a device to cause the device to perform a method comprising: placing the wafer at a location on...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: JI, Xiaoyu, REN, Weiming, GONG, Zizhou
Format: Patent
Sprache:eng ; fre
Schlagworte:
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