SELECTIVE BLOCKING OF METAL SURFACES USING BIFUNCTIONAL SELF-ASSEMBLED MONOLAYERS

Methods for selectively depositing on metallic surfaces are disclosed. Some embodiments of the disclosure utilize a hydrocarbon having at least two functional groups, at least one functional group selected from amino groups, hydroxyl groups, ether linkages or combinations thereof to form a self-asse...

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Bibliographische Detailangaben
Hauptverfasser:	BHUYAN, Bhaskar Jyoti, MCSWINEY, Michael L, PHILLIPS, Drew, XIE, Xiangjin, SALY, Mark, THOMPSON, David, KASHEFI, Kevin, DANGERFIELD, Aaron
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	Methods for selectively depositing on metallic surfaces are disclosed. Some embodiments of the disclosure utilize a hydrocarbon having at least two functional groups, at least one functional group selected from amino groups, hydroxyl groups, ether linkages or combinations thereof to form a self-assembled monolayer (SAM) on metallic surfaces. L'invention concerne des procédés de dépôt sélectif sur des surfaces métalliques. Certains modes de réalisation de l'invention utilisent un hydrocarbure ayant au moins deux groupes fonctionnels, au moins un groupe fonctionnel choisi parmi des groupes amino, des groupes hydroxyle, des liaisons éther ou des combinaisons de ceux-ci pour former une monocouche auto-assemblée (SAM) sur des surfaces métalliques.