METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS

A method of reducing effects of heating and/or cooling a reticle in a lithographic process includes conditioning the reticle to adjust an initial temperature of the reticle to a predetermined temperature, reducing stress in the reticle to reduce parasitic thermal effects, calibrating a reticle heati...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SUBRAMANIAN, Raaja Ganapathy, DANILIN, Alexander, MEIJERINK, Rowin, SHUMIACHER, Stanislav, MOEST, Bearrach, GOOSSEN, Tim
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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