METROLOGY ENCLOSURE INCLUDING SPECTRAL REFLECTOMETRY SYSTEM FOR PLASMA PROCESSING SYSTEM USING DIRECT-DRIVE RADIOFREQUENCY POWER SUPPLY

A plasma processing chamber has an upper window with a coil disposed above the upper window. A coil connection enclosure is disposed above the coil. A metrology enclosure is disposed above the coil connection enclosure. A spectral reflectometry system is disposed within the metrology enclosure. The...

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Hauptverfasser:	PATERSON, Alexander, SILADIE, Cristian, LUQUE, Jorge, DRYMON, Michael, WANG, Yuhou, DREWERY, John, HART, William, CASTANOS-MARTINEZ, Eduardo, GUZMAN, Daniel, MARTIN, Michael
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS
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