ATOMIC LAYER DEPOSITION DEVICE

An atomic layer deposition device, comprising a reaction container (120), wherein a reaction chamber (121) is formed inside the reaction container (120); an air intake assembly, which comprises an air intake member (200), wherein the air intake member (200) is connected to the reaction container (12...

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Bibliographische Detailangaben
Hauptverfasser: CHEN, Rong, LI, Jiawei, LIU, Xiao, YI, Ge, SHAO, Huachen, XIANG, Junren
Format: Patent
Sprache:chi ; eng ; fre
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Beschreibung
Zusammenfassung:An atomic layer deposition device, comprising a reaction container (120), wherein a reaction chamber (121) is formed inside the reaction container (120); an air intake assembly, which comprises an air intake member (200), wherein the air intake member (200) is connected to the reaction container (120), and the air intake member (200) is provided with an air inlet (211) capable of being in communication with the reaction chamber (121); a discharging assembly, which comprises a discharging plug (400) and a discharging pipe (300), wherein the discharging pipe (300) is connected to the reaction container (120), the discharging plug (400) is arranged inside the discharging pipe (300) and is located below a discharging port (250), which is in communication with the reaction chamber (121), and a discharging channel (320) for allowing powder to flow out is formed between the discharging plug (400) and the discharging pipe (300); and a driving member, which is connected to the discharging plug (400), and is used for d