PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

The invention relates to a projection exposure apparatus (1) for semiconductor lithography having at least one component (M3) having a fluid channel (31) and a device (40) for providing a fluid (34) for flowing through the fluid channel (31), the fluid channel (31) being connected to the device (40)...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	RIEF, Klaus
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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