PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

The invention relates to a projection exposure apparatus (1) for semiconductor lithography having at least one component (M3) having a fluid channel (31) and a device (40) for providing a fluid (34) for flowing through the fluid channel (31), the fluid channel (31) being connected to the device (40)...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	RIEF, Klaus
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a projection exposure apparatus (1) for semiconductor lithography having at least one component (M3) having a fluid channel (31) and a device (40) for providing a fluid (34) for flowing through the fluid channel (31), the fluid channel (31) being connected to the device (40) by way of a supply line (41) and an outgoing line (42), and, according to the invention, the supply line (41) and the outgoing line (42) being connected to one another in parallel with the fluid channel (31) via a short circuit (60, 60.1, 60.2). L'invention concerne un appareil d'exposition par projection (1) pour la lithographie à semi-conducteurs ayant au moins un composant (M3) doté d'un canal de fluide (31) et d'un dispositif (40) servant à fournir un fluide (34) destiné à circuler dans le canal de fluide (31), le canal de fluide (31) étant relié au dispositif (40) par l'intermédiaire d'une conduite d'alimentation (41) et d'une conduite de sortie (42), et, selon l'invention, la conduite d'alimentation (41) et la conduite de sortie (42) étant connectées l'une à l'autre en parallèle avec le canal de fluide (31) par l'intermédiaire d'un court-circuit (60, 60.1, 60.2).