DEVICE AND METHOD FOR DISPENSING A GAS PHASE OF A SOLID PRECURSOR

The invention relates to a device for dispensing a gas phase of at least one solid precursor, said device comprising a container (1) intended to contain a solid phase (11) of said precursor, a first heating means (10) configured to heat at least one part of the container (1) and/or of the solid phas...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TODOROVA, Vanina, DULPHY, Hervé, LAURENT, Valere, PLAZA, Sonia
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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