PLASMA PROCESSING DEVICE

Provided is a plasma processing device including a processing chamber 2 and a gas supply device 30 for supplying a gas for processing into the processing chamber 2. The gas supply device 30 includes a mass flow controller box 40 having an intake opening 41 and an exhaust opening 42, a plurality of p...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SATO, Kohei, ISOMURA, Ryoichi, MATSUYOSHI, Tsutomu, KIYOSUE, Kentaro, NAGAI, Koji
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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