LINING DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS

Provided in the embodiments of the present invention are a lining device and a semiconductor processing apparatus. The lining device comprises a lining assembly and an exhaust channel structure, wherein a gas inlet of the exhaust channel structure is in communication with the interior of a process chamber; a gas outlet of the exhaust channel structure is in communication with an exhaust port of the process chamber; the lining assembly comprises a first metal lining ring and an insulating lining ring that are sequentially nested from the center to the edge in a radial direction of the process chamber; the gas inlet of the exhaust channel structure is located on an inner peripheral wall of the first metal lining ring; and an axial length of the first metal lining ring is configured to cover an area above a specified height position of an inner peripheral wall of the insulating lining ring, so as to prevent a thin film from being deposited on the inner peripheral wall of the insulating lining ring. According to