SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus comprising: a stage 30 on which a substrate 2 with a plurality of elements 4a, 4b, 4c disposed thereon is installed; an upper member 21 covering the top of the stage 30 and forming a processing chamber 6 providing a pressurization space between the upper member 21 an...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHIBASAKI, Akito, MIYAGOSHI, Toshinobu, HAYAMI, Kenichi, SUGIYAMA, Chimoto, MITOSE, Tomohisa
Format: Patent
Sprache:eng ; fre ; jpn
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