SUBSTRATE PROCESSING APPARATUS
A substrate processing apparatus comprising: a stage 30 on which a substrate 2 with a plurality of elements 4a, 4b, 4c disposed thereon is installed; an upper member 21 covering the top of the stage 30 and forming a processing chamber 6 providing a pressurization space between the upper member 21 an...
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Format: | Patent |
Sprache: | eng ; fre ; jpn |
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