CARRIER APPARATUS IN SEMICONDUCTOR PROCESSING DEVICE AND SEMICONDUCTOR PROCESSING DEVICE

The present invention provides a carrier apparatus in a semiconductor processing device and the semiconductor processing device. The apparatus comprises a base and an edge ring surrounding the periphery of the base; the outer peripheral surface of the base body and the inner circumferential surface of the edge ring are opposite and spaced from each other to form a first annular air channel; the first annular air channel is configured to be communicated with an air supply system. When the base body carries a wafer, the upper surface of the edge ring and the lower surface of the wafer are opposite and spaced from each other to form a second annular air channel; the first annular air channel is communicated with the second annular air channel. A first width of the first annular air channel in the radial direction of the base and a second width of the second annular air channel in the axial direction of the base are both less than or equal to twice the thickness of a plasma sheath layer generated when the semicon