APPARATUSES FOR UNIFORM FLUID DELIVERY IN A MULTI-STATION SEMICONDUCTOR PROCESSING CHAMBER

The present disclosure relates to a system for a semiconductor processing. The system includes a semiconductor processing chamber having a plurality of processing stations, a plurality of manifold trunks, a plurality of valves, and a plurality of fluid manifolds. Each manifold trunk includes an outl...

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Bibliographische Detailangaben
Hauptverfasser:	MCDANIEL, William Laurence, ANANDHAN DURAISAMY, Arun, JEON, Eli, ROBERTS, Michael Philip, ABEL, Joseph R, AGNEW, Douglas Walter, BOATRIGHT, Daniel
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present disclosure relates to a system for a semiconductor processing. The system includes a semiconductor processing chamber having a plurality of processing stations, a plurality of manifold trunks, a plurality of valves, and a plurality of fluid manifolds. Each manifold trunk includes an outlet, a common flowpath, a plurality of trunk inlets, a plurality of orifices, and a plurality of valve interfaces. La présente divulgation concerne un système de traitement de semi-conducteurs. Le système comprend une chambre de traitement de semi-conducteurs comportant une pluralité de postes de traitement, une pluralité de troncs de collecteur, une pluralité de vannes et une pluralité de collecteurs de fluide. Chaque tronc de collecteur comprend une sortie, un trajet d'écoulement commun, une pluralité d'entrées de tronc, une pluralité d'orifices et une pluralité d'interfaces de vanne.