RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, POLYMER, AND COMPOUND

Provided are: a radiation-sensitive resin composition which can exhibit satisfactory levels of sensitivity, LWR performance and pattern rectangularity; and a pattern formation method. This radiation-sensitive resin composition contains: a resin having a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. In formula (1), R1 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R2 and R3 are each independently a monovalent hydrocarbon group having 1-10 carbon atoms, or these groups combine with each other to form a C3-20 divalent cyclic hydrocarbon group together with the carbon atom to which these are bonded. R4 is a hydrogen atom or a monovalent hydrocarbon group having 1-10 carbon atoms. R5 and R6 are each independently a hydrogen atom or a monovalent hydrocarbon group having 1-10 carbon atoms, or these groups combine with each other to form a C3-20 divalent cyclic hydrocarbon group together with the carbon atom to which these are bonded. R7 and R8 are each independently a hydrogen atom or a monovalent hydrocarbon group having 1-10 carbon atoms, or these groups combine with each other to form a C3-20 divalent cyclic hydrocarbon group together with the carbon atom to which these are bonded. R9 and R10 are each independently a monovalent organic group having 1-10 carbon atoms, or these groups combine with each other to form a 3-30-membered divalent cyclic organic group together with the carbon atom to which these are bonded. n1 is an integer between 1 and 4. If n1 is 2 or more, the plurality of R5 and R6 moieties may be the same as, or different from, each other. n2 is an integer between 0 and 3. If n2 is 2 or more, the plurality of R7 and R8 moieties may be the same as, or different from, each other. L'invention concerne une composition de résine sensible au rayonnement qui présente des niveaux satisfaisant de sensibilité, de performance LWR et de rectangularité de motif. L'invention concerne également un procédé de formation de motif. Cette composition de résine sensible au rayonnement contient : une résine ayant une unité structurale représentée par la formule (1) ; un générateur d'acide sensible au rayonnement ; et un solvant. Dans la formule (1), R1 est un atome d'hydrogène, un atome de fluor, un groupe méthyle ou un groupe trifluorométhyle. R2 et R3 sont chacun indépendamment un groupe hydrocarboné monovalent ayant de 1 à 10 atomes de carbone, ou ces groupes se combinent l'un avec