CONDUCTIVE PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING
A photo-curable composition for use in additive manufacturing, said composition comprising: a) at least one photocurable monomer or oligomer; b) a photoinitiator for polymerization of the monomer; and, from 0.01 to 1 wt.%, based on the weight of the composition, of c) CNS-derived materials. Followin...
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| creator | CHEN, Limeng SULLIVAN, Sean S FITZPATRICK, Darragh KUTSOVSKY, Yakov E ZHANG, Han HERSEE, Rachel SHAH, Tushar ZHANG, Xiaofeng SANCHEZ GARCIA, Angelica M KYRLIDIS, Agathagelos WALTER, Pablo |
| description | A photo-curable composition for use in additive manufacturing, said composition comprising: a) at least one photocurable monomer or oligomer; b) a photoinitiator for polymerization of the monomer; and, from 0.01 to 1 wt.%, based on the weight of the composition, of c) CNS-derived materials. Following polymerization, the resulting polymerized composition has a volume resistivity no greater than 105 ohm.cm.
Composition photodurcissable destinée à être utilisée dans la fabrication additive, ladite composition comprenant : a) au moins un monomère ou oligomère photodurcissable ; b) un photoinitiateur pour la polymérisation du monomère ; et, de 0,01 à 1 % en poids, sur la base du poids de la composition, de (c) matériaux dérivés de CNS. Après polymérisation, la composition polymérisée obtenue présente une résistivité volumique inférieure ou égale à 105 ohm.cm. |
| format | Patent |
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Composition photodurcissable destinée à être utilisée dans la fabrication additive, ladite composition comprenant : a) au moins un monomère ou oligomère photodurcissable ; b) un photoinitiateur pour la polymérisation du monomère ; et, de 0,01 à 1 % en poids, sur la base du poids de la composition, de (c) matériaux dérivés de CNS. Après polymérisation, la composition polymérisée obtenue présente une résistivité volumique inférieure ou égale à 105 ohm.cm.</description><language>eng ; fre</language><subject>ADDITIVE MANUFACTURING TECHNOLOGY ; ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220421&DB=EPODOC&CC=WO&NR=2022081271A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220421&DB=EPODOC&CC=WO&NR=2022081271A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHEN, Limeng</creatorcontrib><creatorcontrib>SULLIVAN, Sean S</creatorcontrib><creatorcontrib>FITZPATRICK, Darragh</creatorcontrib><creatorcontrib>KUTSOVSKY, Yakov E</creatorcontrib><creatorcontrib>ZHANG, Han</creatorcontrib><creatorcontrib>HERSEE, Rachel</creatorcontrib><creatorcontrib>SHAH, Tushar</creatorcontrib><creatorcontrib>ZHANG, Xiaofeng</creatorcontrib><creatorcontrib>SANCHEZ GARCIA, Angelica M</creatorcontrib><creatorcontrib>KYRLIDIS, Agathagelos</creatorcontrib><creatorcontrib>WALTER, Pablo</creatorcontrib><title>CONDUCTIVE PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING</title><description>A photo-curable composition for use in additive manufacturing, said composition comprising: a) at least one photocurable monomer or oligomer; b) a photoinitiator for polymerization of the monomer; and, from 0.01 to 1 wt.%, based on the weight of the composition, of c) CNS-derived materials. Following polymerization, the resulting polymerized composition has a volume resistivity no greater than 105 ohm.cm.
Composition photodurcissable destinée à être utilisée dans la fabrication additive, ladite composition comprenant : a) au moins un monomère ou oligomère photodurcissable ; b) un photoinitiateur pour la polymérisation du monomère ; et, de 0,01 à 1 % en poids, sur la base du poids de la composition, de (c) matériaux dérivés de CNS. Après polymérisation, la composition polymérisée obtenue présente une résistivité volumique inférieure ou égale à 105 ohm.cm.</description><subject>ADDITIVE MANUFACTURING TECHNOLOGY</subject><subject>ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBw9vdzCXUO8QxzVQjw8A_x13UODXJ08nFVcPb3DfAP9gzx9PcLVnDzD1JwdHHxBKvzdfQLdXN0DgkN8vRz52FgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8eH-RgZGRgYWhkbmho6GxsSpAgCPPyv-</recordid><startdate>20220421</startdate><enddate>20220421</enddate><creator>CHEN, Limeng</creator><creator>SULLIVAN, Sean S</creator><creator>FITZPATRICK, Darragh</creator><creator>KUTSOVSKY, Yakov E</creator><creator>ZHANG, Han</creator><creator>HERSEE, Rachel</creator><creator>SHAH, Tushar</creator><creator>ZHANG, Xiaofeng</creator><creator>SANCHEZ GARCIA, Angelica M</creator><creator>KYRLIDIS, Agathagelos</creator><creator>WALTER, Pablo</creator><scope>EVB</scope></search><sort><creationdate>20220421</creationdate><title>CONDUCTIVE PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING</title><author>CHEN, Limeng ; SULLIVAN, Sean S ; FITZPATRICK, Darragh ; KUTSOVSKY, Yakov E ; ZHANG, Han ; HERSEE, Rachel ; SHAH, Tushar ; ZHANG, Xiaofeng ; SANCHEZ GARCIA, Angelica M ; KYRLIDIS, Agathagelos ; WALTER, Pablo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2022081271A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2022</creationdate><topic>ADDITIVE MANUFACTURING TECHNOLOGY</topic><topic>ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>CHEN, Limeng</creatorcontrib><creatorcontrib>SULLIVAN, Sean S</creatorcontrib><creatorcontrib>FITZPATRICK, Darragh</creatorcontrib><creatorcontrib>KUTSOVSKY, Yakov E</creatorcontrib><creatorcontrib>ZHANG, Han</creatorcontrib><creatorcontrib>HERSEE, Rachel</creatorcontrib><creatorcontrib>SHAH, Tushar</creatorcontrib><creatorcontrib>ZHANG, Xiaofeng</creatorcontrib><creatorcontrib>SANCHEZ GARCIA, Angelica M</creatorcontrib><creatorcontrib>KYRLIDIS, Agathagelos</creatorcontrib><creatorcontrib>WALTER, Pablo</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHEN, Limeng</au><au>SULLIVAN, Sean S</au><au>FITZPATRICK, Darragh</au><au>KUTSOVSKY, Yakov E</au><au>ZHANG, Han</au><au>HERSEE, Rachel</au><au>SHAH, Tushar</au><au>ZHANG, Xiaofeng</au><au>SANCHEZ GARCIA, Angelica M</au><au>KYRLIDIS, Agathagelos</au><au>WALTER, Pablo</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CONDUCTIVE PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING</title><date>2022-04-21</date><risdate>2022</risdate><abstract>A photo-curable composition for use in additive manufacturing, said composition comprising: a) at least one photocurable monomer or oligomer; b) a photoinitiator for polymerization of the monomer; and, from 0.01 to 1 wt.%, based on the weight of the composition, of c) CNS-derived materials. Following polymerization, the resulting polymerized composition has a volume resistivity no greater than 105 ohm.cm.
Composition photodurcissable destinée à être utilisée dans la fabrication additive, ladite composition comprenant : a) au moins un monomère ou oligomère photodurcissable ; b) un photoinitiateur pour la polymérisation du monomère ; et, de 0,01 à 1 % en poids, sur la base du poids de la composition, de (c) matériaux dérivés de CNS. Après polymérisation, la composition polymérisée obtenue présente une résistivité volumique inférieure ou égale à 105 ohm.cm.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADDITIVE MANUFACTURING TECHNOLOGY ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TRANSPORTING |
| title | CONDUCTIVE PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING |
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