SUBSTRATE PROCESSING DEVICE

The present invention relates to a substrate processing device, comprising: a chamber; a chamber lid that supports the upper portion of the chamber; a susceptor that is installed to face the chamber lid and supports a substrate; a gas ejection unit that ejects a plurality of gases; and an anti-sag b...

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Bibliographische Detailangaben
Hauptverfasser:	JANG, Dae Soo, YOO, Kwang Su, KIM, Hyeon Chang, SA, Seung Youb, LEE, Ji Hun
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to a substrate processing device, comprising: a chamber; a chamber lid that supports the upper portion of the chamber; a susceptor that is installed to face the chamber lid and supports a substrate; a gas ejection unit that ejects a plurality of gases; and an anti-sag bolt that is installed in the chamber lid and can be combined with the gas injection unit, wherein the anti-sag bolt includes a plurality of flow paths through which a plurality of gases can flow. La présente invention concerne un dispositif de traitement de substrat, comprenant : une chambre ; un couvercle de chambre qui supporte la partie supérieure de la chambre ; un suscepteur qui est installé pour faire face au couvercle de chambre et supporte un substrat ; une unité d'éjection de gaz qui éjecte plusieurs gaz ; et un boulon anti-affaissement qui est installé dans le couvercle de chambre et qui peut être combiné à l'unité d'injection de gaz, le boulon anti-affaissement comprenant une pluralité de trajets d'écoulement à travers lesquels une pluralité de gaz peut s'écouler. 본 발명은 챔버; 상기 챔버의 상부를 지지하는 챔버리드; 상기 챔버리드와 대향하여 설치되며, 기판을 지지하는 서셉터; 복수의 가스를 분사하는 가스분사부; 및 상기 챔버리드에 설치되며, 상기 가스분사부와 결합 가능한 처짐방지볼트를 포함하고, 상기 처짐방지볼트는 복수의 가스가 유동 가능한 복수의 유로를 포함하는 기판처리장치에 관한 것이다.