POROUS MATRIX SUBSTRATE WITH CHLORITE REACTANT FOR PRODUCING CHLORINE DIOXIDE

POROUS MATRIX SUBSTRATE WITH CHLORITE REACTANT FOR PRODUCING CHLORINE DIOXIDE

A porous matrix substrate that has chlorite reactant distributed therein can be used to produce gaseous chlorine dioxide. Ozone-containing gas can pass through the porous matrix substrate and the ozone can react with the chlorite to produce chlorine dioxide. Un substrat de matrice poreuse qui a un r...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WILKINS, Russ R, PETTYGROVE, Megan, WILKINS, James Campbell, PUCHOVICH, Mark J, NIEMASECK, Benjamin
Format: Patent
Sprache:eng ; fre
Schlagworte:
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
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Beschreibung
Zusammenfassung:A porous matrix substrate that has chlorite reactant distributed therein can be used to produce gaseous chlorine dioxide. Ozone-containing gas can pass through the porous matrix substrate and the ozone can react with the chlorite to produce chlorine dioxide. Un substrat de matrice poreuse qui a un réactif de chlorite distribué dans celui-ci peut être utilisé pour produire du dioxyde de chlore gazeux. Un gaz contenant de l'ozone peut passer à travers le substrat de matrice poreuse et l'ozone peut réagir avec le chlorite pour produire du dioxyde de chlore.