SURFACE TREATMENT METHOD FOR CONTAINER FOR STORING HIGH-PURITY HYDROGEN FLUORIDE FOR SEMICONDUCTOR ETCHING

The present invention relates to a surface treatment method for the inside of a container for storing high-purity hydrogen fluoride, comprising: a cylinder pretreatment step for removing moisture inside a cylinder; and a fluorinated passive film formation step for forming a fluorinated passive film...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, Dong Hyun, AHN, Hyeon Geun, JOUNG, Soon Kill, WOO, Byung Won, MOON, Jung Heun
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES FIXED-CAPACITY GAS-HOLDERS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY STORING OF DISTRIBUTING GASES OR LIQUIDS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES WEAPONS
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Beschreibung
Zusammenfassung:	The present invention relates to a surface treatment method for the inside of a container for storing high-purity hydrogen fluoride, comprising: a cylinder pretreatment step for removing moisture inside a cylinder; and a fluorinated passive film formation step for forming a fluorinated passive film on the inner surface of the cylinder by means of anhydrous hydrofluoric acid. The present invention can provide: a surface treatment method which, even in the case of long-term storage of high-purity hydrogen fluoride, can minimize the amounts of impurity gases (hydrogen, oxygen, etc.) generated; and a container, surface-treated according to the method, for storing high-purity hydrogen fluoride. La présente invention concerne un procédé de traitement de surface destiné à l'intérieur d'un récipient de stockage de fluorure d'hydrogène de haute pureté, comprenant : une étape de prétraitement de bouteille pour éliminer l'humidité à l'intérieur d'une bouteille ; et une étape de formation de film passif fluoré pour former un film passif fluoré sur la surface interne de la bouteille au moyen d'acide fluorhydrique anhydre. La présente invention peut fournir : un procédé de traitement de surface qui, même dans le cas d'un stockage à long terme de fluorure d'hydrogène de haute pureté, permet de réduire au minimum les quantités de gaz d'impureté (hydrogène, oxygène, etc.) générées ; et un récipient, ayant subi un traitement de surface selon le procédé, destiné à stocker du fluorure d'hydrogène de haute pureté. 본 발명은 실린더 내부의 수분을 제거하는 실린더 전처리단계; 및 무수불산을 이용하여 실린더 내부 표면에 불화부동태막을 형성하는 불화부동태막 형성단계;를 포함하는 고순도 불화수소 저장 용기 내부의 표면처리방법에 관한 것으로, 고순도 불화수소의 장기간 저장 시에도 수소, 산소 등의 불순물 가스의 발생량을 최소화시킬 수 있는 표면처리방법 및 이에 따라 표면처리된 고순도 불화수소의 저장 용기를 제공할 수 있다.