RESIST PATTERN FORMING METHOD AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

Provided is a resist pattern forming method with which it is possible to form a fine resist pattern for which pattern collapse and development residue are suppressed. This resist pattern forming method includes: a step for coating a composition for forming a resist underlayer film on a base material...

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Bibliographische Detailangaben
Hauptverfasser:	SUZUKI Junya, KOMATSU Hiroyuki, TAJI Tomoya, FURUKAWA Taiichi
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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