FACEPLATE WITH LOCALIZED FLOW CONTROL

Exemplary semiconductor processing chambers may include a gasbox. The chambers may include a substrate support. The chambers may include a blocker plate positioned between the gasbox and the substrate support. The blocker plate may define a plurality of apertures through the plate. The chambers may...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SUN, Junghoon, YU, Hang, THOTTAPPAYIL, Arun, CHOI, Jun Tae, KULKARNI, Mayur Govind
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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