SUBSTRATE PROCESSING DEVICE
Disclosed is a substrate processing device which is improved so that a reaction chamber, in which processes are performed after introducing a substrate, can be symmetrically formed. The substrate processing device may comprise: a chamber which forms a reaction space having an opening portion in at l...
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| Hauptverfasser: | , , |
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| Format: | Patent |
| Sprache: | eng ; fre ; kor |
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| Zusammenfassung: | Disclosed is a substrate processing device which is improved so that a reaction chamber, in which processes are performed after introducing a substrate, can be symmetrically formed. The substrate processing device may comprise: a chamber which forms a reaction space having an opening portion in at least one side wall thereof; and a valve for opening and closing the opening portion. The valve may comprise: a blade for opening and closing the opening portion, the blade being accommodated in the chamber including the side wall and a chamber bottom portion that form the reaction space; and a driving unit for raising and lowering the blade. Thus, in the substrate processing device of the present invention, one surface of the blade may be formed to be flush with the inner surface of the chamber by closing the opening portion.
L'invention concerne un dispositif de traitement de substrat qui est amélioré, de sorte qu'une chambre de réaction, dans laquelle sont effectués des processus après l'introduction d'un substrat, peut être formée de manière symétrique. Le dispositif de traitement de substrat peut comprendre : une chambre qui forme un espace de réaction ayant une partie d'ouverture dans au moins une paroi latérale de celle-ci ; et une soupape pour ouvrir et fermer la partie d'ouverture. La soupape peut comprendre : une lame pour ouvrir et fermer la partie d'ouverture, la lame étant logée dans la chambre comprenant la paroi latérale et une partie inférieure de chambre qui forment l'espace de réaction ; et une unité d'entraînement pour soulever et abaisser la lame. Ainsi, dans le dispositif de traitement de substrat selon la présente invention, une surface de la lame peut être formée pour affleurer la surface interne de la chambre en fermant la partie d'ouverture.
본 발명은 기판이 투입된 후 공정을 진행하는 반응 공간을 대칭적으로 형성할 수 있도록 개선한 기판 처리 장치를 개시하며, 상기 기판 처리 장치는 적어도 일 측벽에 개구부를 갖는 반응 공간을 형성하는 챔버; 및 상기 개구부를 개폐하는 밸브;를 포함하며, 상기 밸브는, 상기 반응 공간을 형성하는 상기 측벽 및 챔버 바닥부를 포함하는 상기 챔버에 수용되며 상기 개구부를 개폐하는 블레이드; 및 상기 블레이드를 승하강시키는 구동부;를 포함할 수 있다. 그러므로, 본 발명의 기판 처리 장치는 상기 개구부의 폐쇄에 의해 상기 블레이드의 일면이 상기 챔버의 내면과 동일면으로 형성될 수 있다. |
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