REACTANT GAS PULSE DELIVERY

Providing herein are methods of delivery of gas reactants to a processing chamber and related apparatus. L'invention concerne des procédés de distribution de réactifs gazeux à une chambre de traitement et un appareil associé.

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Bibliographische Detailangaben
Hauptverfasser:	SINGH, Sumit Subhash, BIRRU, Krishna, SUN, Yong, ZHANG, Xing, BOWES, Michael, KHO, Leonard Wai Fung, CHANDRASHEKAR, Anand
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Providing herein are methods of delivery of gas reactants to a processing chamber and related apparatus. L'invention concerne des procédés de distribution de réactifs gazeux à une chambre de traitement et un appareil associé.