APPARATUS FOR PROCESSING A WAFER

An apparatus for processing a wafer, the apparatus comprising: a rotatable chuck for receiving and rotating a wafer; a heating device arranged to heat a wafer received by the rotatable chuck; a plate that is transparent to radiation emitted by the heating device; and a plate holder that holds an out...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BRUGGER, Michael, PUTZI, Christian, PUGGL, Michael
Format: Patent
Sprache:eng ; fre
Schlagworte:
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