VACUUM PROCESSING APPARATUS, VACUUM SYSTEM, GAS PARTIAL PRESSURE CONTROL ASSEMBLY, AND METHOD OF CONTROLLING PARTIAL PRESSURE OF A GAS IN A VACUUM PROCESSING CHAMBER

A vacuum processing apparatus (110) for deposition of a material on a substrate is provided. The vacuum processing apparatus (110) includes a vacuum chamber comprising a processing area (111); a deposition apparatus (112) within the processing area (111) of the vacuum chamber; a cooling surface (113...

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Bibliographische Detailangaben
Hauptverfasser:	GRILLMAYER, Jürgen, CHEN, Chun Cheng, LIN, Shin-Hung, CHANG, Hung-wen, GEBELE, Thomas, YANG, Chi-Chang, MUNDORF, Christoph
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION WEAPONS
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Beschreibung
Zusammenfassung:	A vacuum processing apparatus (110) for deposition of a material on a substrate is provided. The vacuum processing apparatus (110) includes a vacuum chamber comprising a processing area (111); a deposition apparatus (112) within the processing area (111) of the vacuum chamber; a cooling surface (113) inside the vacuum chamber; and one or more movable shields (220) between the cooling surface (113) and the processing area (111). L'invention concerne un appareil de traitement sous vide pour le dépôt d'un matériau sur un substrat. L'appareil de traitement sous vide (110) comprend une chambre à vide comprenant une zone de traitement (111) ; un appareil de dépôt (112) à l'intérieur de la zone de traitement (111) de la chambre à vide ; une surface de refroidissement (113) à l'intérieur de la chambre à vide ; et un ou plusieurs écrans mobiles (220) entre la surface de refroidissement (113) et la zone de traitement (111).