TREATMENT CONDITION SPECIFICATION METHOD, SUBSTRATE TREATMENT METHOD, SUBSTRATE PRODUCT MANUFACTURING METHOD, COMPUTER PROGRAM, STORAGE MEDIUM, TREATMENT CONDITION SPECIFICATION DEVICE, AND SUBSTRATE TREATMENT DEVICE

In this treatment condition specification method, a recipe information item usable when a substrate W is treated while a treatment liquid discharge position is moved is specified from among a plurality of recipe information items. This treatment condition specification method includes step S31, step...

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Hauptverfasser:	INAGI Dai, OTA Takashi, SHIMANO Tatsuya
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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