LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening ar...

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Bibliographische Detailangaben
Hauptverfasser:	BANINE, Vadim, NIKIPELOV, Andrey, DE VRIES, Sjoerd, HUANG, Yang-Shan, TE SLIGTE, Edwin, VAN DE KERKHOF, Marcus, NENCHEV, Georgi, UMSTADTER, Karl, UZGÖREN, Eray, BAL, Kursat, YAGHOOBI, Parham, RAASVELD, Thomas, HUANG, Zhuangxiong, BRULS, Richard, JACOBS, Johannes, ALBRIGHT, Ronald, MOORS, Johannes, FRIJNS, Olav, RANJAN, Manish
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus. Appareil comprenant : un appareil de réception de rayonnement pourvu d'une ouverture permettant de recevoir un rayonnement provenant d'une source de rayonnement à travers l'ouverture; l'appareil de réception de rayonnement comprenant un appareil de déviation agencé pour modifier une trajectoire d'une particule arrivant au niveau de l'appareil de réception de rayonnement, à travers l'ouverture.