APPARATUS AND METHOD FOR THIN FILM DEPOSITION

A thin film deposition system including a modular reactor head, a substrate stage and a modular reactor head positioning system. The modular reactor head positioning positions the modular reactor head with respect to the substrate to deliver precursor gases to a substrate located on the substrate st...

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Bibliographische Detailangaben
Hauptverfasser:	KAO, Manfred, TEOH, Chee Hau, MUSSELMAN, Kevin P, LOKE, Jhi Yong
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	A thin film deposition system including a modular reactor head, a substrate stage and a modular reactor head positioning system. The modular reactor head positioning positions the modular reactor head with respect to the substrate to deliver precursor gases to a substrate located on the substrate stage. The modular reactor head includes a set of modular components that perform different functionalities and may be placed in different configurations. L'invention concerne un système de dépôt de couche mince comprenant une tête de réacteur modulaire, une platine de substrat et un système de positionnement de tête de réacteur modulaire. Le système de positionnement de tête de réacteur modulaire positionne la tête de réacteur modulaire par rapport au substrat pour distribuer des gaz précurseurs à un substrat situé sur la platine de substrat. La tête de réacteur modulaire comprend un ensemble de composants modulaires qui réalisent différentes fonctionnalités et peuvent être placés dans différentes configurations.