ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION

Provided herein are approaches for decreasing particle generation in an electrostatic lens. In some embodiments, an ion implantation system may include an electrostatic lens including an entrance for receiving an ion beam and an exit for delivering the ion beam towards a target, the electrostatic le...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CUCCHETTI, Antonella, LINDBERG, Robert C, SCHEUER, Jay T, HERMANSON, Eric D, LIKHANSKII, Alexandre, SINCLAIR, Frank
Format: Patent
Sprache:eng ; fre
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