DEVICE AND METHOD FOR MEASURING SUBSTRATES FOR SEMICONDUCTOR LITHOGRAPHY

The invention relates to a device (1) for measuring a substrate (8) for semiconductor lithography, comprising an illumination optical unit (4), an imaging optical unit (10) and a recording device (16) arranged in the image plane (15) of the imaging optical unit (10), a diffractive element (13) being...

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Bibliographische Detailangaben
Hauptverfasser:	SEIDEL, Dirk, MATEJKA, Ulrich
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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