ETCHING DEVICE FOR SILICON CORE WIRE AND ETCHING METHOD FOR SILICON CORE WIRE

Provided is a device capable of uniformly etching the entire surface of a silicon core wire. An etching device (1) for silicon core wires (C1, C2, C3) is provided with: etching solution tanks (11, 12) for holding etching solutions (L1, L2); multiple core wire support members (31), which are for supp...

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Bibliographische Detailangaben
Hauptverfasser: YOKOSE, Takuya, SAKAI, Junya
Format: Patent
Sprache:eng ; fre ; jpn
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