PATTERNED X-RAY EMITTING TARGET

The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluoresce...

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Bibliographische Detailangaben
Hauptverfasser: REED, David. A, NEWCOME, Bruce H, SCHUELER, Bruno W
Format: Patent
Sprache:eng ; fre
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Beschreibung
Zusammenfassung:The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets. L'objet de la présente invention est de fournir des cibles d'émission de rayons X à motifs améliorées ainsi que des sources de rayons X qui comprennent des cibles d'émission de rayons X à motifs de même que des systèmes de diffusiométrie de réflectance de rayons X (XRS) et comprenant également des systèmes de spectroscopie photoélectronique de rayons X (XPS) et des systèmes de fluorescence de rayons X (XRF) qui utilisent de telles cibles d'émission de rayons X.