VANADIUM SILICARBIDE FILM, VANADIUM SILICARBIDE FILM-COATED MEMBER, AND METHOD FOR PRODUCING VANADIUM SILICARBIDE FILM-COATED MEMBER

Provided is a vanadium silicarbide film comprising vanadium, silicon, and carbon, and the total of the vanadium element concentration, the silicon element concentration, and the carbon element concentration in the film is at least 90 at%. L'invention concerne un film de silicarbure de vanadium...

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Bibliographische Detailangaben
Hauptverfasser:	HABUKA, Satoru, MATSUOKA, Hiroyuki
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Provided is a vanadium silicarbide film comprising vanadium, silicon, and carbon, and the total of the vanadium element concentration, the silicon element concentration, and the carbon element concentration in the film is at least 90 at%. L'invention concerne un film de silicarbure de vanadium comprenant du vanadium, du silicium et du carbone, et le total de la concentration d'élément de vanadium, de la concentration d'élément de silicium et de la concentration d'élément de carbone dans le film étant d'au moins 90 % at. バナジウムと、珪素と、炭素とを含有し、膜中のバナジウム元素濃度と、珪素元素濃度と、炭素元素濃度の合計が９０ａｔ％以上である、珪炭化バナジウム膜。