APPARATUS AND TECHNIQUES FOR ION ENERGY MEASUREMENT IN PULSED ION BEAMS

An apparatus may include a first beam sensor, disposed adjacent a first position along a beamline. The apparatus may further include a second beam sensor, disposed adjacent a second position along the beamline, at a predetermined distance, downstream of the first beam sensor. The apparatus may inclu...

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Bibliographische Detailangaben
1. Verfasser: LEE, W. Davis
Format: Patent
Sprache:eng ; fre
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