ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, RESIST FILM, AND ELECTRONIC DEVICE PRODUCTION METHOD
Provided is an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained even when the composition has been stored for a long period of time. Also provided are a resist film, a pattern formation method, and an electronic devi...
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Format: | Patent |
Sprache: | eng ; fre ; jpn |
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