ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, RESIST FILM, AND ELECTRONIC DEVICE PRODUCTION METHOD

Provided is an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained even when the composition has been stored for a long period of time. Also provided are a resist film, a pattern formation method, and an electronic devi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: OKA Hironori, KOJIMA Masafumi, USHIYAMA Aina, KATO Keita, MARUMO Kazuhiro, SHIRAKAWA Michihiro, GOTO Akiyoshi
Format: Patent
Sprache:eng ; fre ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!