METHOD OF CONTROLLING A POSITION OF A FIRST OBJECT RELATIVE TO A SECOND OBJECT, CONTROL UNIT, STAGE APPARATUS AND LITHOGRAPHIC APPARATUS

The invention provides a method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus, the method comprising: a. generating a measurement signal representing a position of the first object relative to the secon...

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Bibliographische Detailangaben
Hauptverfasser:	KAMIDI, Ramidin, KOENEN, Willem, VAN KEULEN, Thijs, COX, Hendrikus
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	The invention provides a method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus, the method comprising: a. generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position; b. determining a gradient associated with the initial relative position, based on the measurement signal; c. determining a position set point based on the gradient; d. controlling the position of the first object relative to the second object to a further relative position, based on the position set point. L'invention concerne un procédé de détermination d'une position relative souhaitée entre un premier objet d'un appareil lithographique et un second objet de l'appareil lithographique, le procédé consistant : a. à générer un signal de mesure représentant une position du premier objet par rapport au second objet, à une position relative initiale; b. à déterminer un gradient associé à la position relative initiale, sur la base du signal de mesure; c. à déterminer une consigne de position sur la base du gradient; d. à commander la position du premier objet par rapport au second objet dans une autre position relative, sur la base de la consigne de position.