MEMS DEVICE AND PREPARATION METHOD THEREFOR, AND ELECTRONIC DEVICE

A MEMS device, an electronic device comprising the MEMS device, and a preparation method for the MEMS device, a thin film structure (10) of the MEMS device comprising a first rigid area (110) having a first rigidity positioned in a middle area and a second rigid area (120) having a second rigidity p...

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Bibliographische Detailangaben
Hauptverfasser:	LO, Sung-Cheng, HSIEH, Kuan-Hong, CHAN, Chun-Kai, FANG, Weileun, YOU, Bo-cheng
Format:	Patent
Sprache:	chi ; eng ; fre
Schlagworte:	MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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Beschreibung
Zusammenfassung:	A MEMS device, an electronic device comprising the MEMS device, and a preparation method for the MEMS device, a thin film structure (10) of the MEMS device comprising a first rigid area (110) having a first rigidity positioned in a middle area and a second rigid area (120) having a second rigidity positioned in an edge area, the first rigidity being less than the second rigidity, and the second rigid area comprising at least one protrusion (122) extending outward from the surface of the thin film structure (10). The preparation method of the MEMS device comprises: providing a substrate (210); forming a trench (212) on the substrate (210); and providing the thin film structure (10). By means of increasing the process margin during reaming of the support structure, the MEMS device ensures that the rigidity of the first rigid area (110) of the thin film structure will not be substantially changed as a result of reaming error, in order to avoid affecting the performance of the MEMS device. L'invention concerne un