METHOD FOR PRODUCING ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

The present invention addresses the first problem of providing a method for producing an active light ray-sensitive or radiation-sensitive resin composition, by which a pattern having excellent LWR can be formed even in cases where the resin composition is prepared using a procedure comprising preparing in advance a polymer solution containing an acid-dissociable resin and a solvent, storing the polymer solution for a prescribed period of time, and then mixing the polymer solution with other raw materials such as a photo-acid generator. In addition, the present invention addresses the second problem of providing: a method for forming a pattern by using an active light ray-sensitive or radiation-sensitive resin composition obtained using the production method; and a method for producing an electronic device. This method for producing an active light ray-sensitive or radiation-sensitive resin composition includes a step A for preparing a polymer solution that contains a solvent and a resin whose polarity increases upon decomposition through the action of an acid; a step B for producing a solution-accommodating body which includes an accommodating container and the polymer solution housed in the accommodating container, and in which the content of an inert gas is 85 vol% or more of the space inside the accommodating container that is not filled with the polymer solution, and for storing the polymer solution in the solution-accommodating body; and a step C for mixing the polymer solution stored in the solution-accommodating body with a compound that generates an acid upon irradiation with active light rays or radiation. The resin whose polarity increases upon decomposition through the action of an acid is a resin that includes a prescribed structure. La présente invention aborde le premier problème consistant à fournir un procédé de production d'une composition de résine sensible aux rayons de lumière active ou sensible au rayonnement, grâce à laquelle un motif ayant un excellent LWR peut être formé même dans les cas où la composition de résine est préparée à l'aide d'une procédure comprenant la préparation à l'avance d'une solution de polymère contenant une résine dissociable par un acide et un solvant, le stockage de la solution de polymère pendant une période de temps prescrite, puis le mélange de la solution de polymère avec d'autres matières premières telles qu'un générateur de photo-acide. De plus, la présente invention aborde le second problème consista