DEPOSITION MASK AND METHODS OF MANUFACTURING AND USING A DEPOSITION MASK
Generally, examples described herein relate to deposition masks and methods of manufacturing and using such deposition masks. An example includes a method for forming a deposition mask. A mask layer is deposited on a substrate. Mask openings are patterned through the mask layer. A central portion of...
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description | Generally, examples described herein relate to deposition masks and methods of manufacturing and using such deposition masks. An example includes a method for forming a deposition mask. A mask layer is deposited on a substrate. Mask openings are patterned through the mask layer. A central portion of the substrate is removed to define a substrate opening through a periphery portion of the substrate. The mask layer with the mask openings through the mask layer extending across the substrate opening.
De manière générale, des exemples décrits dans la présente invention concernent des masques de dépôt et des procédés de fabrication et d'utilisation de tels masques de dépôt. Un exemple comprend un procédé de formation d'un masque de dépôt. Une couche de masque est déposée sur un substrat. Des ouvertures de masque sont formées par motifs à travers la couche de masque. Une partie centrale du substrat est éliminée pour définir une ouverture de substrat à travers une partie périphérique du substrat. La couche de masque ayant les ouvertures de masque à travers la couche de masque s'étend à travers l'ouverture de substrat. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2020190444A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2020190444A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2020190444A13</originalsourceid><addsrcrecordid>eNrjZPBwcQ3wD_YM8fT3U_B1DPZWcPRzUfB1DfHwdwlW8HcDivmFujk6h4QGefq5gyVDg8EsBTSNPAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7UkPtzfyMDIwNDSwMTExNHQmDhVAKZDLZE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DEPOSITION MASK AND METHODS OF MANUFACTURING AND USING A DEPOSITION MASK</title><source>esp@cenet</source><creator>MORAES, Kevin ; LERNER, Alexander N</creator><creatorcontrib>MORAES, Kevin ; LERNER, Alexander N</creatorcontrib><description>Generally, examples described herein relate to deposition masks and methods of manufacturing and using such deposition masks. An example includes a method for forming a deposition mask. A mask layer is deposited on a substrate. Mask openings are patterned through the mask layer. A central portion of the substrate is removed to define a substrate opening through a periphery portion of the substrate. The mask layer with the mask openings through the mask layer extending across the substrate opening.
De manière générale, des exemples décrits dans la présente invention concernent des masques de dépôt et des procédés de fabrication et d'utilisation de tels masques de dépôt. Un exemple comprend un procédé de formation d'un masque de dépôt. Une couche de masque est déposée sur un substrat. Des ouvertures de masque sont formées par motifs à travers la couche de masque. Une partie centrale du substrat est éliminée pour définir une ouverture de substrat à travers une partie périphérique du substrat. La couche de masque ayant les ouvertures de masque à travers la couche de masque s'étend à travers l'ouverture de substrat.</description><language>eng ; fre</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200924&DB=EPODOC&CC=WO&NR=2020190444A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200924&DB=EPODOC&CC=WO&NR=2020190444A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MORAES, Kevin</creatorcontrib><creatorcontrib>LERNER, Alexander N</creatorcontrib><title>DEPOSITION MASK AND METHODS OF MANUFACTURING AND USING A DEPOSITION MASK</title><description>Generally, examples described herein relate to deposition masks and methods of manufacturing and using such deposition masks. An example includes a method for forming a deposition mask. A mask layer is deposited on a substrate. Mask openings are patterned through the mask layer. A central portion of the substrate is removed to define a substrate opening through a periphery portion of the substrate. The mask layer with the mask openings through the mask layer extending across the substrate opening.
De manière générale, des exemples décrits dans la présente invention concernent des masques de dépôt et des procédés de fabrication et d'utilisation de tels masques de dépôt. Un exemple comprend un procédé de formation d'un masque de dépôt. Une couche de masque est déposée sur un substrat. Des ouvertures de masque sont formées par motifs à travers la couche de masque. Une partie centrale du substrat est éliminée pour définir une ouverture de substrat à travers une partie périphérique du substrat. La couche de masque ayant les ouvertures de masque à travers la couche de masque s'étend à travers l'ouverture de substrat.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPBwcQ3wD_YM8fT3U_B1DPZWcPRzUfB1DfHwdwlW8HcDivmFujk6h4QGefq5gyVDg8EsBTSNPAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7UkPtzfyMDIwNDSwMTExNHQmDhVAKZDLZE</recordid><startdate>20200924</startdate><enddate>20200924</enddate><creator>MORAES, Kevin</creator><creator>LERNER, Alexander N</creator><scope>EVB</scope></search><sort><creationdate>20200924</creationdate><title>DEPOSITION MASK AND METHODS OF MANUFACTURING AND USING A DEPOSITION MASK</title><author>MORAES, Kevin ; LERNER, Alexander N</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2020190444A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2020</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>MORAES, Kevin</creatorcontrib><creatorcontrib>LERNER, Alexander N</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MORAES, Kevin</au><au>LERNER, Alexander N</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DEPOSITION MASK AND METHODS OF MANUFACTURING AND USING A DEPOSITION MASK</title><date>2020-09-24</date><risdate>2020</risdate><abstract>Generally, examples described herein relate to deposition masks and methods of manufacturing and using such deposition masks. An example includes a method for forming a deposition mask. A mask layer is deposited on a substrate. Mask openings are patterned through the mask layer. A central portion of the substrate is removed to define a substrate opening through a periphery portion of the substrate. The mask layer with the mask openings through the mask layer extending across the substrate opening.
De manière générale, des exemples décrits dans la présente invention concernent des masques de dépôt et des procédés de fabrication et d'utilisation de tels masques de dépôt. Un exemple comprend un procédé de formation d'un masque de dépôt. Une couche de masque est déposée sur un substrat. Des ouvertures de masque sont formées par motifs à travers la couche de masque. Une partie centrale du substrat est éliminée pour définir une ouverture de substrat à travers une partie périphérique du substrat. La couche de masque ayant les ouvertures de masque à travers la couche de masque s'étend à travers l'ouverture de substrat.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | DEPOSITION MASK AND METHODS OF MANUFACTURING AND USING A DEPOSITION MASK |
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