LID ASSEMBLY APPARATUS AND METHODS FOR SUBSTRATE PROCESSING CHAMBERS

The present disclosure relates to a lid assembly apparatus and related methods for substrate processing chambers. In one implementation, a lid assembly includes a gas manifold. The gas manifold includes a first gas channel configured to receive a process gas, a second gas channel configured to recei...

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Bibliographische Detailangaben
Hauptverfasser:	DESAI, Prashant A, NGUYEN, Truong, BANGALORE, Vidyadharan Srinivasa Murthy, KEDLAYA, Diwakar N, AGARWAL, Sumit, HUANG, Zubin, KUMARANKUTTY, Hanish Kumar Panavalappil
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present disclosure relates to a lid assembly apparatus and related methods for substrate processing chambers. In one implementation, a lid assembly includes a gas manifold. The gas manifold includes a first gas channel configured to receive a process gas, a second gas channel configured to receive a doping gas, and a third gas channel configured to receive a cleaning gas. The lid assembly also includes a showerhead. The showerhead includes one or more first gas openings that are configured to receive the process gas, and one or more second gas openings that are configured to receive the doping gas. La présente invention concerne un appareil à ensemble couvercle et des procédés associés pour des chambres de traitement de substrat. Dans un mode de réalisation, un ensemble couvercle comprend un collecteur de gaz. Le collecteur de gaz comprend un premier canal de gaz conçu pour recevoir un gaz de traitement, un deuxième canal de gaz conçu pour recevoir un gaz de dopage, et un troisième canal de gaz conçu pour recevoir un gaz de nettoyage. L'ensemble couvercle comprend également une pomme de douche. La pomme de douche comprend une ou plusieurs premières ouvertures de gaz qui sont conçues pour recevoir le gaz de traitement, et une ou plusieurs secondes ouvertures de gaz qui sont conçues pour recevoir le gaz de dopage.