DEVICE FOR PREVENTING INGRESS OF FLOATING MATTER ON FREE SURFACES OF LADLE AND TUNDISH DURING CONTINUOUS CASTING PROCESS

A device for preventing ingress of floating matter on the free surfaces of a ladle and a tundish, each having a discharge port, during a continuous casting process according to an embodiment of the present invention is configured for installation at the discharge ports of the ladle and the tundish,...

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Bibliographische Detailangaben
Hauptverfasser: GO, Jae Hyeong, LEE, Jong Hee, PARK, Il Seouk, SON, Jong Hyeon, KIM, Yeong Jin
Format: Patent
Sprache:eng ; fre ; kor
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Zusammenfassung:A device for preventing ingress of floating matter on the free surfaces of a ladle and a tundish, each having a discharge port, during a continuous casting process according to an embodiment of the present invention is configured for installation at the discharge ports of the ladle and the tundish, and comprises: a disc-shaped plate; and a support part installed at the plate and configured to support the plate on a surface around each of the discharge ports of the ladle and the tundish, wherein each of the ratio of the radius of the discharge port of the ladle to the width of the plate and the ratio of the radius of the discharge port of the tundish to the width of the plate has a value equal to or larger than 1. L'invention concerne, selon un mode de réalisation, un dispositif destiné à empêcher l'infiltration de matière flottante sur les surfaces libres d'une poche de coulée et d'un panier de coulée, chacun ayant un orifice d'évacuation, pendant un processus de coulée continue, conçu pour être installé au niveau des orifices d'évacuation de la poche et du panier de coulée, et comprenant : une plaque discoïde ; et une partie support installée au niveau de la plaque et conçue pour supporter la plaque sur une surface entourant chaque orifice d'évacuation de la poche et du panier de coulée, le rapport entre le rayon de l'orifice d'évacuation de la poche de coulée et la largeur de la plaque ainsi que le rapport entre le rayon de l'orifice d'évacuation du panier de coulée et la largeur de la plaque ayant une valeur égale ou supérieure à 1. 일 실시예에 따른 연속 주조 공정 중 배출 포트를 각각 갖는 래들 및 턴디쉬의 자유 표면의 부유물 혼입 방지 장치는 상기 래들 및 상기 턴디쉬의 배출 포트에 설치되도록 구성되고, 상기 부유물 혼입 방지 장치는 디스크 형상의 플레이트 및 상기 플레이트에 설치되고, 상기 래들 및 상기 턴디쉬의 각각의 배출 포트 주변의 표면에 대해 상기 플레이트를 지지하도록 구성된 지지부를 포함하고, 상기 래들의 배출 포트의 반지름 대비 상기 플레이트의 폭의 비율 및 상기 턴디쉬의 배출 포트의 반지름 대비 상기 플레이트의 폭의 비율은 각각 적어도 1 이상이다.