PROCESS FOR IMPROVING FLASH SINTERING OF CERAMICS AND IMPROVED CERAMICS

Methods of flash sintering have been developed in which particle are initially coated with thin layers by atomic layer deposition (ALD). Examples are provided in which 8 mol% yttria-stabilized zirconia (8YSZ) particles are coated with small quantities of AI2O3 by particle atomic layer deposition (AL...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	YOON, Bola, O'TOOLE, Rebecca, WEIMER, Alan, RAJ, Rishi
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Methods of flash sintering have been developed in which particle are initially coated with thin layers by atomic layer deposition (ALD). Examples are provided in which 8 mol% yttria-stabilized zirconia (8YSZ) particles are coated with small quantities of AI2O3 by particle atomic layer deposition (ALD). Sintered materials that result from the process have been characterized. Sintered materials having unique characteristics are also described. Des procédés de frittage instantané ont été développés dans lesquels des particules sont initialement revêtues de couches minces par un dépôt de couche atomique (ALD). Selon certains modes de réalisation donnés à titre d'exemple, 8 % en moles de particules de zircone stabilisée à l'oxyde d'yttrium (8YSZ) sont revêtues de petites quantités d'Al2O3 par un dépôt de couche atomique de particules (ALD). Des matériaux frittés obtenus à partir du procédé ont été caractérisés. L'invention concerne également des matériaux frittés ayant des caractéristiques uniques.