ONE-COMPONENT POLISHING SLURRY COMPOSITION AND POLISHING METHOD USING SAME
The present invention relates to a one-component polishing slurry composition and a polishing method using same and, more specifically, to a one-component polishing slurry composition and a polishing method using same, the one-component polishing slurry composition comprising: abrasive particles; an...
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Format: | Patent |
Sprache: | eng ; fre ; kor |
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Zusammenfassung: | The present invention relates to a one-component polishing slurry composition and a polishing method using same and, more specifically, to a one-component polishing slurry composition and a polishing method using same, the one-component polishing slurry composition comprising: abrasive particles; and a polishing selectivity regulator, wherein the polishing selectivity regulator provides a change in the polishing selectivity of non-Prestonian behavior according to polishing pressure.
La présente invention concerne une composition de suspension de polissage à un composant et un procédé de polissage l'utilisant et, plus spécifiquement, une composition de suspension de polissage à un composant et un procédé de polissage l'utilisant, la composition de suspension de polissage à un composant comprenant : des particules abrasives; et un régulateur de sélectivité de polissage, le régulateur de sélectivité de polissage fournissant un changement de la sélectivité de polissage d'un comportement non prestonien en fonction de la pression de polissage.
본 발명은, 일액형 연마 슬러리 조성물 및 이를 이용한 연마 방법에 관한 것으로, 보다 구체적으로, 연마 입자; 및 연마 선택비 조절제;를 포함하고, 상기 연마 선택비 조절제는, 연마 압력에 따라 비-프레스토니안(non-Prestonian) 거동의 연마 선택비 변화를 제공하는 것인, 일액형 연마 슬러리 조성물 및 이를 이용한 연마 방법에 관한 것이다. |
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