FILM DEPOSITION DEVICE AND FILM DEPOSITION METHOD

A film deposition device which deposits a prescribed film on a substrate via PEALD, and has a treatment vessel for housing the substrate in an airtight manner and a placement stand on which the substrate is placed inside the treatment vessel, wherein: the treatment vessel has an exhaust port through...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HSIEH, Chiju, FUNAKUBO, Takao, YOSHIKOSHI, Daisuke, AZUMA, Yuki, KOBAYASHI, Hideyuki, IWASAKI, Takahisa, NAGAIKE, Hiroshi
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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