CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A SUBSTRATE PROCESSING SYSTEM
An exhaust system for a substrate processing system includes a radical generator configured to receive a gas mixture including halogen species and to generate halogen radicals, a first pump to pump exhaust gas from an exhaust outlet of a processing chamber, and a first valve configured to selectivel...
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| creator | BIRRU, Krishna KHO, Leonard LIU, Gang CHANDRASHEKAR, Anand HSU, Gishun |
| description | An exhaust system for a substrate processing system includes a radical generator configured to receive a gas mixture including halogen species and to generate halogen radicals, a first pump to pump exhaust gas from an exhaust outlet of a processing chamber, and a first valve configured to selectively fluidly connect an outlet of the radical generator to the first pump downstream from the outlet of the processing chamber.
L'invention concerne un système d'évacuation destiné à un système de traitement de substrat comprenant un générateur de radicaux conçu pour recevoir un mélange gazeux comprenant des espèces halogènes et pour générer des radicaux halogènes, une première pompe, permettant de pomper des gaz d'évacuation à partir d'une sortie d'évacuation d'une chambre de traitement, et une première vanne, conçue pour relier en communication fluidique et sélectivement une sortie du générateur de radicaux à la première pompe, en aval de la sortie de la chambre de traitement. |
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L'invention concerne un système d'évacuation destiné à un système de traitement de substrat comprenant un générateur de radicaux conçu pour recevoir un mélange gazeux comprenant des espèces halogènes et pour générer des radicaux halogènes, une première pompe, permettant de pomper des gaz d'évacuation à partir d'une sortie d'évacuation d'une chambre de traitement, et une première vanne, conçue pour relier en communication fluidique et sélectivement une sortie du générateur de radicaux à la première pompe, en aval de la sortie de la chambre de traitement.</description><language>eng ; fre</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191219&DB=EPODOC&CC=WO&NR=2019241718A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191219&DB=EPODOC&CC=WO&NR=2019241718A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BIRRU, Krishna</creatorcontrib><creatorcontrib>KHO, Leonard</creatorcontrib><creatorcontrib>LIU, Gang</creatorcontrib><creatorcontrib>CHANDRASHEKAR, Anand</creatorcontrib><creatorcontrib>HSU, Gishun</creatorcontrib><title>CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A SUBSTRATE PROCESSING SYSTEM</title><description>An exhaust system for a substrate processing system includes a radical generator configured to receive a gas mixture including halogen species and to generate halogen radicals, a first pump to pump exhaust gas from an exhaust outlet of a processing chamber, and a first valve configured to selectively fluidly connect an outlet of the radical generator to the first pump downstream from the outlet of the processing chamber.
L'invention concerne un système d'évacuation destiné à un système de traitement de substrat comprenant un générateur de radicaux conçu pour recevoir un mélange gazeux comprenant des espèces halogènes et pour générer des radicaux halogènes, une première pompe, permettant de pomper des gaz d'évacuation à partir d'une sortie d'évacuation d'une chambre de traitement, et une première vanne, conçue pour relier en communication fluidique et sélectivement une sortie du générateur de radicaux à la première pompe, en aval de la sortie de la chambre de traitement.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjD0LwjAUALM4iPofHjgLpgrWMcYXGzB5IS_1Y7EUiZNoof5_RBBcnQ6O44bioveovPU74DMndGAoQkRHh4_bYiC2icFEchBqF8B6UB7wVKmaE5ABBVxvOEWVEEIkjcy_3VgMbu29z5MvR2JqMOlqlrtnk_uuveZHfjVHKuZyXSzlSpZKLv6r3gE7NA0</recordid><startdate>20191219</startdate><enddate>20191219</enddate><creator>BIRRU, Krishna</creator><creator>KHO, Leonard</creator><creator>LIU, Gang</creator><creator>CHANDRASHEKAR, Anand</creator><creator>HSU, Gishun</creator><scope>EVB</scope></search><sort><creationdate>20191219</creationdate><title>CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A SUBSTRATE PROCESSING SYSTEM</title><author>BIRRU, Krishna ; KHO, Leonard ; LIU, Gang ; CHANDRASHEKAR, Anand ; HSU, Gishun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2019241718A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>BIRRU, Krishna</creatorcontrib><creatorcontrib>KHO, Leonard</creatorcontrib><creatorcontrib>LIU, Gang</creatorcontrib><creatorcontrib>CHANDRASHEKAR, Anand</creatorcontrib><creatorcontrib>HSU, Gishun</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BIRRU, Krishna</au><au>KHO, Leonard</au><au>LIU, Gang</au><au>CHANDRASHEKAR, Anand</au><au>HSU, Gishun</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A SUBSTRATE PROCESSING SYSTEM</title><date>2019-12-19</date><risdate>2019</risdate><abstract>An exhaust system for a substrate processing system includes a radical generator configured to receive a gas mixture including halogen species and to generate halogen radicals, a first pump to pump exhaust gas from an exhaust outlet of a processing chamber, and a first valve configured to selectively fluidly connect an outlet of the radical generator to the first pump downstream from the outlet of the processing chamber.
L'invention concerne un système d'évacuation destiné à un système de traitement de substrat comprenant un générateur de radicaux conçu pour recevoir un mélange gazeux comprenant des espèces halogènes et pour générer des radicaux halogènes, une première pompe, permettant de pomper des gaz d'évacuation à partir d'une sortie d'évacuation d'une chambre de traitement, et une première vanne, conçue pour relier en communication fluidique et sélectivement une sortie du générateur de radicaux à la première pompe, en aval de la sortie de la chambre de traitement.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES |
| title | CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A SUBSTRATE PROCESSING SYSTEM |
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