REFLECTANCE REDUCTION OF SUBSTRATE FOR TRANSMITTING INFRARED LIGHT

The present invention discloses the use of implanted ions within a substrate to decrease the infrared reflectance of a substrate for transmitting infrared light, where the ions are selected from one or more of the ions of N, H, O, He, Ne, Ar, and Kr and are implanted in the substrate with a dosage c...

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Bibliographische Detailangaben
Hauptverfasser:	ROQUINY, Philippe, JACQUES, Amory, NAVET, Benjamine
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	The present invention discloses the use of implanted ions within a substrate to decrease the infrared reflectance of a substrate for transmitting infrared light, where the ions are selected from one or more of the ions of N, H, O, He, Ne, Ar, and Kr and are implanted in the substrate with a dosage comprised between 1016 ions/cm² and 2 × 1017 ions/cm², and an acceleration voltage AV comprised between 5.5 kV and 450 kV. La présente invention concerne l'utilisation d'ions implantés au sein d'un substrat pour diminuer la réflectance infrarouge d'un substrat pour la transmission de lumière infrarouge, les ions étant un ou plusieurs ions choisis parmi les ions de N, H, O, He, Ne, Ar et Kr et étant implantés dans le substrat en une dose comprise entre 1016 ions/cm² et 2 × 1017 ions/cm² et avec une tension d'accélération AV comprise entre 5,5 kV et 450 kV.