NOVEL OXIME ESTER COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME

The present invention relates to an oxime ester group-substituted aromatic compound, a preparation method therefor, and a photoresist composition comprising same and is useful for providing a photosensitive composition, which effectively absorbs UV and exhibits high sensitivity. La présente inventio...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MOON, Bong Seok, CHIN, Sung Min, BYUN, Ugun, PARK, No Gill, LEE, Hyun Woo, KANG, Ji Soung, LEE, Gyu Sung, HONG, Won Ki, HA, Min Su, JIN, Sang Jun
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention relates to an oxime ester group-substituted aromatic compound, a preparation method therefor, and a photoresist composition comprising same and is useful for providing a photosensitive composition, which effectively absorbs UV and exhibits high sensitivity. La présente invention concerne un composé aromatique substitué par un groupe ester d'oxime, son procédé de préparation, et une composition de résine photosensible le comprenant et elle est utile pour obtenir une composition photosensible qui absorbe efficacement les UV et présente une sensibilité élevée. 본 발명은 옥심에스테르기가 치환된 방향족화합물, 이의 제조방법 및 이를 포함하는 포토레지스트 조성물에 관한 것으로서 UV를 효율적으로 흡수하여 고감도의 감광성 조성물을 제공하는데 유용하다.