PRESSURE SKEW SYSTEM FOR CONTROLLING CENTER-TO-EDGE PRESSURE CHANGE

Embodiments described herein relate to a pressure skew system for controlling the center-to-edge pressure change in a chamber for depositing an advanced patterning film with improved overall uniformity. The pressure skew system includes pumping zones configured to be formed in a chamber, walls dispo...

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Bibliographische Detailangaben
1. Verfasser: SRIVASTAVA, Shailendra
Format: Patent
Sprache:eng ; fre
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