METHOD, MEASURING SYSTEM AND LITHOGRAPHY APPARATUS

What is disclosed is a method for localizing an abnormality (500) in a travel path (x, y) of an optical component (202) in or for a lithography apparatus (100A, 100B) comprising the following steps: a) moving the optical component (202) in at least one first degree of freedom (Fx, Fy), b) detecting...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TREUBEL, Frank, FETZER, Christoph
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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