METHOD, MEASURING SYSTEM AND LITHOGRAPHY APPARATUS

METHOD, MEASURING SYSTEM AND LITHOGRAPHY APPARATUS

What is disclosed is a method for localizing an abnormality (500) in a travel path (x, y) of an optical component (202) in or for a lithography apparatus (100A, 100B) comprising the following steps: a) moving the optical component (202) in at least one first degree of freedom (Fx, Fy), b) detecting...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TREUBEL, Frank, FETZER, Christoph
Format: Patent
Sprache:eng ; fre
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:What is disclosed is a method for localizing an abnormality (500) in a travel path (x, y) of an optical component (202) in or for a lithography apparatus (100A, 100B) comprising the following steps: a) moving the optical component (202) in at least one first degree of freedom (Fx, Fy), b) detecting a movement (Rz) of the optical component (202) and/or a force (Mz) acting on the optical component (202) in at least one second degree of freedom (FRz) and c) localizing the abnormality (500) as a function of the movement (Rz) detected in step b) and/or the force (Mz) detected in step b). L'invention concerne un procédé de localisation d'une anomalie (500) dans un trajet de déplacement (x, y) d'un composant optique (202) dans ou destiné à un appareil de lithographie (100A, 100B) comprenant : a) déplacer le composant optique (202) dans au moins un premier degré de liberté (Fx, Fy), b) détecter un mouvement (Rz) du composant optique (202) et/ou une force (Mz) agissant sur le composant optique (202) dans au moins un second degré de liberté (FRz) et c) localiser l'anomalie (500) en fonction du mouvement (Rz) détecté à l'étape b) et/ou de la force (Mz) détectée à l'étape b).